Cleanroom Internal Equipment "Clean Air Oven"
Suitable for drying resist films! We accommodate various requests according to the dimensions and types of products and materials.
In the semiconductor industry, processes such as wafer annealing, resist film drying, lens drying after cleaning in the optical field, and sterile drying of medical equipment are ideally suited for controlled "clean ovens" in high-temperature and high-purity environments. Our company offers "clean air ovens" in both "standard" types with an internal temperature range of 60 to 200°C, as well as "special" types such as steam ovens and large ovens. Additionally, we accommodate various requests based on the dimensions and types of products and materials. Please feel free to contact us when you need assistance. 【Standard Clean Air Oven Specifications (Partial)】 ■ Model: ACO-200-554K ■ Cleanliness (at room temperature, overall efficiency): ISO Class 5 (Class 100) ■ Dust collection efficiency: 99.97% or more for 0.3μm particles ■ Dust collection elements: - Main filter: High-temperature HEPA filter - Pre-filter: Non-woven fabric filter *For more details, please refer to the PDF document or feel free to contact us.
- 企業：日本エアーテック 本社
- 価格：Other
